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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - EUV mask blank defect inspection strategies for 32-nm half-pitch and beyond
Wurm, Stefan, Watanabe, Hidehiro, Han, Hakseung, Kearney, Patrick, Cho, Wonil, Jeon, Chan-Uk, Gullikson, EricVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.729029
File:
PDF, 428 KB
english, 2007