SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - PDL oxide enabled pitch doubling
Shamma, Nader, Chou, Wen-Ben, Kalinovski, Ilia, Schlosser, Don, Mountsier, Tom, Mui, Collin, Tarafdar, Raihan, van Schravendijk, BartVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.771514
File:
PDF, 485 KB
english, 2008