SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Resist pattern inspection function for LM7500 reticle inspection system
Moribe, Hideyuki, Horiuchi, Toshiyuki, Kato, Yoshikazu, Nakamura, Kazuyoshi, Bashomatsu, Takeshi, Igeta, Takahiro, Ogihara, Kazuhito, Okada, TakehikoVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793059
File:
PDF, 917 KB
english, 2008