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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Defect inspection of imprinted 32 nm half pitch patterns
Selinidis, Kosta, Kawahira, Hiroichi, Zurbrick, Larry S., Thompson, Ecron, McMackin, Ian, Perez, Joseph, Sreenivasan, S. V., Resnick, Douglas J.Volume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801948
File:
PDF, 2.71 MB
english, 2008