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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Embedded micro/nano channel formation for three-dimensional negative-tone photoresist microstructuring
Kim, Sang-Kon, Henderson, Clifford L., Oh, Hye-Keun, Jung, Young-Dae, An, IlsinVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814244
File:
PDF, 730 KB
english, 2009