SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Calibration of 25-nm pitch grating reference by high-resolution grazing incidence x-ray diffraction
Ito, Yoshiyasu, Raymond, Christopher J., Omote, Kazuhiko, Okazaki, Yuko, Nakayama, Yoshinori, Kawada, HirokiVolume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.846519
File:
PDF, 819 KB
english, 2010