SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Carbon contamination topography analysis of EUV masks
La Fontaine, Bruno M., Fan, Yu-Jen, Yankulin, Leonid, Thomas, Petros, Mbanaso, Chimaobi, Antohe, Alin, Garg, Rashi, Wang, Yunfei, Murray, Thomas, Wüest, Andrea, Goodwin, Frank, Huh, Sungmin, Cordes, AVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846996
File:
PDF, 3.42 MB
english, 2010