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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask
Sakamoto, Yoshifumi, Montgomery, M. Warren, Maurer, Wilhelm, Hirose, Tomohito, Tsukuda, Hitomi, Yamazaki, Taichi, Kojima, Yosuke, Ida, Hayato, Haraguchi, Takashi, Tanaka, Tsuyoshi, Koitabashi, Ryuji,Volume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.867710
File:
PDF, 746 KB
english, 2010