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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Novel CD-SEM magnification calibration reference of sub-50-nm pitch multi-layer grating with positional identification mark
Raymond, Christopher J., Nakayama, Yoshinori, Yamamoto, Jiro, Inoue, Osamu, Kawada, Hiroki, Yoneda, ShozoVolume:
7971
Year:
2011
Language:
english
DOI:
10.1117/12.879347
File:
PDF, 1.39 MB
english, 2011