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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Solutions for 22-nm node patterning using ArFi technology
Finders, Jo, Dusa, Mircea, Mulkens, Jan, Cao, Yu, Escalante, MaryanaVolume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.881598
File:
PDF, 1.60 MB
english, 2011