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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVIII - Yokohama, Japan (Wednesday 13 April 2011)] Photomask and Next-Generation Lithography Mask Technology XVIII - Binary 193nm photomasks aging phenomenon study
Dufaye, Félix, Konishi, Toshio, Sartelli, Luca, Pogliani, Carlo, Gough, Stuart, Sundermann, Frank, Miyashita, Hiroyuki, Hidenori, Yoshioka, Charras, Nathalie, Brochard, Christophe, Thivolle, NicolasVolume:
8081
Year:
2011
Language:
english
DOI:
10.1117/12.898867
File:
PDF, 1.42 MB
english, 2011