![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Sensitivity analysis of line-edge roughness measured by means of scatterometry: a simulation-based investigation
Bilski, Bartosz, Frenner, Karsten, Osten, Wolfgang, Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.916348
File:
PDF, 987 KB
english, 2012