SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Calibration and verification of a stochastic model for EUV resist
Gao, Weimin, Philippou, Alexander, Klostermann, Ulrich, Siebert, Joachim, Philipsen, Vicky, Hendrickx, Eric, Vandeweyer, Tom, Lorusso, Gian, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.917804
File:
PDF, 1.57 MB
english, 2012