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SPIE Proceedings [SPIE 1985 Los Angeles Technical Symposium - Los Angeles (Monday 21 January 1985)] Advanced Applications of Ion Implantation - Thermal Annealing Behavior Of Hydrogen-Free Amorphous Silicon And Germanium
Hubler, Graham K., Donovan, Edward P., Wang, Kou-Wei, Spitzer, William G., Current, Michael I., Sadana, Devindra K.Volume:
530
Year:
1985
Language:
english
DOI:
10.1117/12.946490
File:
PDF, 396 KB
english, 1985