SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Mechanisms Of The Dissolution Inhibition Effect And Their Application To Designing Novel Deep-UV Resists
Murata, Makoto, Koshiba, Mitsunobu, Harita, Yoshiyuki, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953017
File:
PDF, 1.79 MB
english, 1989