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In Situ Measurement for Evaluating Temperature Change Related to Silicon Film Formation in a SiHCl 3 -H 2 System
Miyazaki, Kento, Saito, Ayumi, Habuka, HitoshiVolume:
5
Year:
2016
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0101602jss
File:
PDF, 964 KB
english, 2016