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SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Compatibility of CD-SEM metrology with advanced e-beam resists
Ng, Waiman, Anderson, Geoffrey T., Weaver, Suzanne, Lem, Homer Y., Grenon, Brian J., Abboud, Frank E.Volume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332820
File:
PDF, 2.41 MB
english, 1998