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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET
Shieh, W. B., Smith, Bruce W., Chou, William, Yang, Chuen-Huei, Wu, J. K., Chen, Noah, Yen, Shih M., Hsu, Tony, Tuan, Steve, Chang, Doris, Rudzinski, Maciej W., Wang, Lantian, Son, KongVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.544243
File:
PDF, 1.45 MB
english, 2004