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[(Me3Si)2N]3Lu: Molecular Structure and Use as Lu and Si Source for Atomic Layer Deposition of Lu Silicate Films
G. Scarel, C. Wiemer, M. Fanciulli, I. L. Fedushkin, G. K. Fukin, G. A. Domrachev, Y. Lebedinskii, A. Zenkevich, G. PaviaVolume:
633
Year:
2007
Language:
english
Pages:
7
DOI:
10.1002/zaac.200700223
File:
PDF, 153 KB
english, 2007