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ChemInform Abstract: Thin Silicon Dioxide Using the Rapid Thermal Oxidation (RTO) Process for Trench Capacitors.
MIYAI, Y., YONEDA, K., OISHI, H., UCHIDA, H., INOUE, M.Volume:
19
Journal:
ChemInform
DOI:
10.1002/chin.198818334
Date:
May, 1988
File:
PDF, 159 KB
1988