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A calculation method of deposition profiles in chemical vapor deposition reactors using bio-inspired algorithms
Takahashi, Takahiro, Inagaki, Taeka, Nariai, Shingo, Kodama, Junichi, Arakawa, Masamoto, Ema, YoshinoriVolume:
12
Language:
english
Journal:
physica status solidi (c)
DOI:
10.1002/pssc.201510056
Date:
July, 2015
File:
PDF, 332 KB
english, 2015