Interfacial and electrical characteristics of a HfO...

Chinese Physics B 2015 / 12 Vol. 24; Iss. 12

Interfacial and electrical characteristics of a HfO 2 /n–InAlAs MOS-capacitor with different dielectric thicknesses

Guan, He, Lv, Hong-Liang, Guo, Hui, Zhang, Yi-Men, Zhang, Yu-Ming, Wu, Li-Fan
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Volume:
24
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/24/12/126701
Date:
December, 2015
File:
PDF, 372 KB
english, 2015
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