ECWR plasma enhanced chemical vapour deposition of...

Journal of Physics Conference Series 2014 / 11 Vol. 550

ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films

Farsari, E, Kalampounias, A G, Amanatides, E, Mataras, D
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Volume:
550
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/550/1/012031
Date:
November, 2014
File:
PDF, 823 KB
english, 2014
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