[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Poly recess depth in two different trench MOSFETs measured with scatterometry: AM: Advanced metrology
Heider, Franz, Janeschitz, Christian, Haberjahn, Martin, New, Chi Eng, Chow, Kin Loon, Roberts, Jeffrey W.Year:
2016
Language:
english
DOI:
10.1109/asmc.2016.7491102
File:
PDF, 579 KB
english, 2016