SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Optimization of partially coherent illumination in x-ray lithography (Poster Paper)
Cerrina, Franco, Guo, Jerry Z., Peckerar, Martin C.Volume:
1671
Year:
1992
Language:
english
DOI:
10.1117/12.136046
File:
PDF, 281 KB
english, 1992