![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Plasma deposition, characterization, and photochemistry of organosilicon hydride network polymers: versatile resists for all-dry mid-deep UV photolithography
Weidman, Timothy W., Joshi, Ajey M., Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154746
File:
PDF, 57 KB
english, 1993