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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Delay-time stable chemically amplified deep-UV resist
Przybilla, Klaus J., Kinoshita, Yoshiaki, Kudo, Takanori, Masuda, Seiya, Okazaki, Hiroshi, Padmanaban, Munirathna, Pawlowski, Georg, Roeschert, Horst, Spiess, Walter, Suehiro, Natusmi, Hinsberg, WilliVolume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154803
File:
PDF, 1.69 MB
english, 1993