SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Mitigating mask roughness via pupil filtering
Lai, Kafai, Erdmann, Andreas, Baylav, B., Maloney, C., Levinson, Z., Bekaert, J., Vaglio Pret, A., Smith, B.Volume:
9052
Year:
2014
Language:
english
DOI:
10.1117/12.2045668
File:
PDF, 1016 KB
english, 2014