SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Plasma technology for advanced quartz mask etching
Ackmann, Paul W., Hayashi, Naoya, Iwami, Munenori, Ita, Hirotsugu, Kase, Yoshihisa, Azumano, Hidehito, Nakazawa, Kazuki, Okamoto, Yoshie, Shirahama, Hiroki, Yoshimori, Tomoaki, Muto, Makoto, Ganachev,Volume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2073069
File:
PDF, 380 KB
english, 2014