![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - NXT:1980Di immersion scanner for 7nm and 5nm production nodes
Erdmann, Andreas, Kye, Jongwook, de Graaf, Roelof, Weichselbaum, Stefan, Droste, Richard, McLaren, Matthew, Koek, Bert, de Boeij, WimVolume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2220589
File:
PDF, 2.05 MB
english, 2016