SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Effects of complex illumination on lithography performance
Stagaman, Gregory J., Eakin, Ronald J., Sardella, John C., Johnson, Jeffrey R., Spinner III, Charles R., Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240958
File:
PDF, 518 KB
english, 1996