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SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask
Dao, Giang T., Liu, Gang, Snyder, Alan, Farnsworth, Jeff N., Yoshihara, HideoVolume:
2793
Year:
1996
Language:
english
DOI:
10.1117/12.245240
File:
PDF, 740 KB
english, 1996