SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III - Plasma reactor etch modeling using inductively coupled plasma spectroscopy diagnostic techniques
Mautz, Karl E., Ghanbari, Abe, Toprac, Anthony J.Volume:
3213
Year:
1997
Language:
english
DOI:
10.1117/12.284643
File:
PDF, 321 KB
english, 1997