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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Methodology for the optimization of an i-line lithographic process for defect reduction
Phan, Khoi A., Bains, Gurjeet S., Steele, David A., Orth, Jonathan A., Subramanian, Ramkumar, Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308739
File:
PDF, 3.96 MB
english, 1998