SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Subresolution assist feature and off-axis illumination optimization for 200- and 240-nm contact windows using 248-nm lithography
Watson, Pat G., Cirelli, Raymond A., Timko, Allen G., Nalamasu, Omkaram, Lockstamphor, Carl, Berger, Steven D., Bassom, Neil J., Sundaram, Ganesh, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310743
File:
PDF, 2.01 MB
english, 1998