![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Influence of aberration on performance during use of resolution enhancement technology
Tsujita, Kouichirou, Sakai, Junjiro, Nakae, Akihiro, Nakao, Shuji, Wakamiya, Wataru, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310820
File:
PDF, 1.67 MB
english, 1998