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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications
Joubert, Olivier P., Fuard, D., Monget, Cedric, Schiavone, Patrick, Toublan, Olivier, Prola, Alain, Temerson, J. M., Inglebert, R. L., Weidman, Timothy W., Nault, Michael P., Bekiaris, N., Conley, WilVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350191
File:
PDF, 1.35 MB
english, 1999