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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Bilayer silylation process for 193-nm lithography
Satou, Isao, Kuhara, Koichi, Endo, Masayuki, Morimoto, Hiroaki, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350208
File:
PDF, 1.53 MB
english, 1999