SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique
Lu, Bing, Dentinger, Paul M., Taylor, James W., Feke, Gilbert D., Hessman, Dan, Wu, Qiang, Grober, Robert D., Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351121
File:
PDF, 254 KB
english, 1999