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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Masking materials for 157-nm lithography
Smith, Bruce W., Bourov, Anatoly, Lassiter, Matthew, Cangemi, Michael J., Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373337
File:
PDF, 427 KB
english, 1999