SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Characterization of wafer-induced shift on overlay target using post- etch artifact wafers
Wong, Alan S., Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386532
File:
PDF, 1.84 MB
english, 2000