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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Design and synthesis of new photoresist materials for ArF lithography
Choi, Sang-Jun, Kim, Hyun-Woo, Woo, Sang-Gyun, Moon, Joo-Tae, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388333
File:
PDF, 1.50 MB
english, 2000