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SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Lithography for Semiconductor Manufacturing II - Front-end-of-line process development using 193-nm lithography
Pollentier, Ivan K., Ercken, Monique, Eliat, Astrid, Delvaux, Christie, Jaenen, Patrick, Ronse, Kurt G., Mack, Chris A., Stevenson, TomVolume:
4404
Year:
2001
Language:
english
DOI:
10.1117/12.425235
File:
PDF, 1.95 MB
english, 2001