![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Lithography process design for 4-Gb DRAM of 0.31 K1 with KrF
Park, Joonsoo, Yeo, Gisung, Kim, Insung, Kim, Byeongsoo, Lee, Junghyun, Cho, Hanku, Moon, Joo-Tae, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435720
File:
PDF, 926 KB
english, 2001