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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Examination of a simplified reaction-diffusion model for post-exposure bake of chemically amplified resists
Smith, Mark D., Mack, Chris A., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436827
File:
PDF, 311 KB
english, 2001