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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Use of nanomachining as a technique to reduce scrap of high-end photomasks
White, Roy, Verbeek, Martin, Bozak, Ron, Klos, Marty, Dao, Giang T., Grenon, Brian J.Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458294
File:
PDF, 2.91 MB
english, 2002