SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - CD prediction by threshold energy resist model (TERM)
Yoo, Ji-Yong, Kwon, Yeong-Keun, Park, Jun-Taek, Sohn, Dong-Soo, Kim, Sang-Gon, Sohn, Young-Soo, Oh, Hye-Keun, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474510
File:
PDF, 68 KB
english, 2002