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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Fogging and pattern loading effect by writing strategy
Cho, Junsik S., Baek, Seung Hee, Nam, Kyung-Han, Cho, H. J., Courboin, Daniel, Jeong, Seong-Ho, Lee, In-Soo, Shin, Cheol, Kim, Hong-Seok, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476943
File:
PDF, 951 KB
english, 2002