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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Investigation of model OPC optimization based on CD uniformity yield
Roy, Sabita, Chen, J. Fung, Liebchen, Armin, Laidig, Thomas L., Wampler, Kurt E., Hollerbach, Uwe, Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.482746
File:
PDF, 839 KB
english, 2003