SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - A novel photoacid generator for chemically amplified photoresist with ArF exposure
Asakura, Toshikage, Yamato, Hitoshi, Matsumoto, Akira, Murer, Peter, Ohwa, Masaki, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
DOI:
10.1117/12.483733
File:
PDF, 219 KB
2003